Study on of Polishing Technology of Diamond Films for Missile Dome

段红文; 王国杰

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Study on of Polishing Technology of Diamond Films for Missile Dome

更新时间：2026-09-14

- Study on of Polishing Technology of Diamond Films for Missile Dome
- 导弹头罩金刚石膜抛光技术研究
- Vol. 30, Issue 2, Pages: 122-126(2009)
- 作者机构：
  
  山西北方风雷工业集团有限公司
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Published：2009
- 稿件说明：
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段红文, 王国杰. Study on of Polishing Technology of Diamond Films for Missile Dome[J]. 2009, 30(2): 122-126.
DOI：

段红文, 王国杰. Study on of Polishing Technology of Diamond Films for Missile Dome[J]. 2009, 30(2): 122-126. DOI：

摘要

化学气相沉积(Chemical Vapor Deposition

CVD)金刚石膜已广泛用于导弹头罩等军事装备中

但其抛光的难度较大.在研究机械、激光、化学辅助机械、磨料水射流、热化学等典型曲面CVD金刚石膜抛光方法原理和特点的基础上

重点研究了热化学抛光方法

并采用热化学法对导弹头罩金刚石膜进行了抛光试验

结果表明

热化学抛光法能够有效地抛光曲面金刚石膜

抛光效率较高

满足导弹头罩金刚石膜的各项指标要求.

Abstract

CVD diamond films have been widely used in military equipment of missile dome

but its polishing is difficult.On the basis of different polishing methods for diamond film

including method of machine

laser

chemistry-assisted machine

abrasive water jet and thermo-chemistry

the thermo-chemical method was studied emphatically.And the polishing experiment was carried out by thermo-chemical method for missile dome diamond films.The results indicate that thermo-chemical method is the effective way to polish the diamond films of curved surface with high efficiency

which meets the parameter demands of the missile dome diamond films.

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Keywords

references

Malshe A P,Park B S,Brown W D,et al.A review of polishing and planarizing chemically vapor deposited(CVD)diamond films and substrates[J].Diamond and Materials,1999(8):1198-1213.

Cappelli E,Mattei G,Orland S,et al.Pulsed laser surface modifications of diamond thin films[J].Diamond andMaterials,1999(8):257-261.

陈春林,王成勇,陈君.金刚石膜机械和机械-化学抛光[J].金刚石与磨料磨具工程,2002(1):1-6.Chen Chunlin,Wang Chengyong,Chen Jun.Mechanical and chemically-assisted mechanical polishing of CVDdiamond Film[J].Diamond and Abrasives Engineering,2002(1):1-6.(in Chinese)

徐锋,左敦稳,王珉.CVD金刚石厚膜的机械抛光及其残余应力的分析[J].人工晶体学,2004(3):31-35.Xu Feng,Zuo Dunwen,Wang Min.Study on mechanical Polishing for CVD diamond thick film and its residualstress[J].Journal of Synthetic Crystals,2004(3):31-35.(in Chinese)

Windischmann H,Glenn F Epps,Yue Cong,et al.Intrinsic stress in diamond films prepared by microwave plasmaCVD[J].Journal of Applied Physics,1991(4):2231-2237.

Jeong J H,Lee S Y.Mechanical analysis for crack-free release of chemical vapour deposited diamond wafers[J].Diamond and Related Materials,2002(11):1597-1605.

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